D.N. Negev, Israel

Igal Ben-Dayan

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials Israel Limited. Active years: 2008.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Igal Ben-Dayan: Pioneering Innovations in Electrostatic Technology

Introduction:

Igal Ben-Dayan, a distinguished inventor hailing from D.N. Negev, IL, has made significant contributions to the field of electrostatic technology. His inventive prowess and relentless drive for excellence have cemented his position as a trailblazer in the realm of inventions.

Latest Patents:

Igal Ben-Dayan's notable patent is the "Particle trap for electrostatic chuck - Wafer supporting apparatus," which features an innovative electrostatic chuck designed to support wafers. This apparatus includes an electrostatic shield positioned near the chuck and the wafer, along with a voltage source that applies an electric field to prevent particle penetration onto the wafer.

Career Highlights:

Currently affiliated with Applied Materials Israel Limited, Igal Ben-Dayan continues to spearhead groundbreaking innovations in the field of electrostatic technology. His unwavering commitment to pushing the boundaries of technological advancements has garnered him widespread recognition in the industry.

Collaborations:

Throughout his illustrious career, Igal Ben-Dayan has collaborated with esteemed colleagues such as Igor Petrov and Igor Krivts (Krayvitz). Together, they have worked tirelessly to develop cutting-edge solutions that have revolutionized the world of electrostatic technology.

Conclusion:

In conclusion, Igal Ben-Dayan's remarkable dedication to innovation and his exceptional problem-solving skills have positioned him as a visionary inventor in the realm of electrostatic technology. His invaluable contributions continue to inspire and shape the future of technological advancements, setting new benchmarks for excellence in the field.

Profile summary based on public USPTO records.
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