Chandler, AZ, United States of America

Ifeanyi Okafor

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Intel Corporation. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ifeanyi Okafor. Retrieved from https://idiyas.com/inventor/ifeanyi-okafor

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 12.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Ifeanyi Okafor

Introduction

Ifeanyi Okafor is a notable inventor based in Chandler, AZ (US). He has made significant contributions to the field of integrated circuit assemblies. His work focuses on enhancing the efficiency and reliability of electronic devices.

Latest Patents

Ifeanyi Okafor holds a patent for "Barrier structures for underfill containment." This invention involves an integrated circuit assembly that includes an electronic substrate and two integrated circuit devices. The design features a barrier structure that helps contain underfill material, ensuring better performance and durability of electronic components. He has 1 patent to his name.

Career Highlights

Ifeanyi is currently employed at Intel Corporation, a leading technology company known for its innovations in semiconductor manufacturing. His role involves developing advanced technologies that contribute to the efficiency of electronic devices.

Collaborations

Throughout his career, Ifeanyi has collaborated with talented individuals such as Ziyin Lin and Vipul V Mehta. These partnerships have fostered a creative environment that encourages innovation and problem-solving.

Conclusion

Ifeanyi Okafor's contributions to the field of integrated circuit technology exemplify the impact of innovative thinking in electronics. His patent and work at Intel Corporation highlight his commitment to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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