Nagaokakyo, Japan

Ichiro Nakaso


 

Average Co-Inventor Count = 6.5

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2015-2019

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4 patents (USPTO):Explore Patents

Title: Ichiro Nakaso: Innovator in Dielectric Resin Technology

Introduction

Ichiro Nakaso is a prominent inventor based in Nagaokakyo, Japan. He has made significant contributions to the field of dielectric resin compositions, particularly for film capacitors. With a total of 4 patents to his name, Nakaso's work has advanced the technology used in electronic components.

Latest Patents

His latest patents include a dielectric resin composition for film capacitors. This innovative composition is a mixture containing two organic materials, A and B. The organic material A consists of at least two kinds of components that have reactive groups, such as OH and NCO, which can cross-link with each other. The organic material B, on the other hand, does not have reactive sites and maintains a dielectric loss tan δ of 0.3% or less at a temperature of 125°C. The mixture achieves a glass transition temperature of 130°C or higher, ideally not exceeding 280°C. This technology aims to enhance the heat resistance of film capacitors by utilizing a dielectric resin composition that is cured through the crosslinking of organic materials with functional groups.

Career Highlights

Ichiro Nakaso is currently employed at Murata Manufacturing Co., Ltd., a leading company in the electronics industry. His work focuses on developing advanced materials that improve the performance and reliability of electronic components.

Collaborations

Some of his notable coworkers include Tomomichi Ichikawa and Norihiro Yoshikawa, who have collaborated with him on various projects related to dielectric materials.

Conclusion

Ichiro Nakaso's contributions to dielectric resin technology have positioned him as a key figure in the field of electronics. His innovative patents continue to influence the development of high-performance film capacitors.

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