Tokyo, Japan

Ichiro Murai


Average Co-Inventor Count = 1.1

ph-index = 6

Forward Citations = 112(Granted Patents)


Location History:

  • Tokyo, JP (1993 - 1995)
  • Sagamihara, JP (1994 - 1995)

Company Filing History:


Years Active: 1993-1995

Loading Chart...
8 patents (USPTO):Explore Patents

Title: Ichiro Murai: Innovator in Semiconductor Technology

Introduction

Ichiro Murai is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work has been instrumental in advancing the capabilities of semiconductor devices.

Latest Patents

Murai's latest patents include a semiconductor device and method for fabricating the same. This innovative semiconductor device comprises a semiconductor substrate of a first conductivity type and a pair of spaced diffused layers of a second conductivity type, which is different from the first. A gate electrode is formed on a channel region between the pair of diffused layers, with an intermediate gate oxide layer disposed therebetween. Additionally, a silicon dioxide film covers the upper surface and side surfaces of the gate electrode and the surface portions of the substrate where the diffused layers are formed. A side wall made of polycrystalline silicon is also included, along with an interlayer insulating film that covers the silicon dioxide film, the side wall, and the substrate. A contact hole is formed through the interlayer insulating film to reach one of the diffused layers, exposing part of the side wall within the contact hole, which is then oxidized.

Another notable patent involves a semiconductor device featuring trench-type capacitors. This device includes a silicon substrate, an insulator film formed on the substrate, a transistor provided on the insulator film, and a capacitor formed in a trench within the insulator film. The method of manufacturing this device is also outlined in the patent.

Career Highlights

Ichiro Murai is currently employed at Nippon Steel Corporation, where he continues to innovate in semiconductor technology. His work has garnered attention for its practical applications and contributions to the industry.

Collaborations

Murai has collaborated with notable colleagues, including Tomofune Tani and Kenji Anzai. Their combined expertise has furthered advancements in semiconductor research and development.

Conclusion

Ichiro Murai's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of advanced semiconductor devices.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…