Ichiro Kodaka is a notable inventor based in Berkeley, CA (US). He holds a total of 3 patents that showcase his contributions to the field of polishing technology. His innovative work has significantly impacted the industry, particularly in the development of advanced polishing pads.

Latest Patents

Kodaka's latest patents include a "Polishing pad and method of producing same." This invention features a transparent pad with a polishing surface that has an average surface roughness of 5 µm or less. The pad is designed with an indentation on its back surface, which alters the rate of light transmission locally. The transparent pad achieves a light transmission rate of at least 10%, and preferably 30%, for light within the wavelength range of 350 nm–900 nm. Another significant patent is the "Layered support and method for laminating CMP pads." This invention provides a device and method for laminating CMP pads while minimizing damage and enhancing adhesion during the lamination process.

Career Highlights

Throughout his career, Ichiro Kodaka has worked with several prominent companies, including Mipox International Corporation and Nihon Micro Coating Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to the advancement of polishing technologies.

Collaborations

Kodaka has collaborated with notable coworkers such as Takuya Nagamine and Claughton Miller. Their combined expertise has fostered innovation and development in their respective fields.

Conclusion

Ichiro Kodaka's contributions to polishing technology through his patents and collaborations highlight his role as a significant inventor in the industry. His work continues to influence advancements in polishing methods and materials.

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