Mipox International Corporation

Nihon Micro Coating Co., Ltd.

Ichiro Kodaka

Takuya Nagamine

Claughton Miller

Mitsuru Saito

Toshihiro Kobayashi

Hisatomo Ohno

Alvin Timbang

Margarita Castillo

Toshihiro Izumi

Charles Sischile

A transparent pad having a polishing surface with an average surface roughness of 5 &#x3bc;m or less is used as a polishing pad. An indentation is formed on the back surface of the transparent pad such that its rate of light transmission is locally changed. The transparent pad has a rate of light transmission equal to or greater than 10% or preferably 30% for light of at least one wavelength in the range of 350 nm&#x2013;900 nm.

Polishing pad and method of producing same

A device and method for laminating CMP pads includes supporting the CMP pad with a board having material compositions similar to the CMP pad. By thus supporting the CMP pad during lamination, there is less likelihood of damage to the CMP pad and better adhesion from lamination. In particular, the CMP pad materials are laminated while in contact with a first board that may have a recess to accept the CMP pad. The pad has dimensions that are equal to or greater than the pad material. In an alternative embodiment, a board is provided on the opposite side of the CMP pad for lamination.

Layered support and method for laminating CMP pads

A cutting tool for simultaneously carrying out a facing operation and a grooving operation on a target surface has a facing part and a grooving part that protrudes from and may be integrally formed with the facing part. The facing part has a facing surface for carrying out the facing operation and the grooving part has a grooving surface and is for cutting a groove of a specified depth and width on the target surface simultaneously as the cutting tool is moved in a specified forward direction parallel to the target surface. The dimensions of the facing and grooving parts, the roughness of their surfaces, the angles of their cutting edges and the sloping angles of the facing and grooving surfaces with respect to the forward direction are each required to be within a specified range. Where the grooving part protrudes from the facing part, the corners at which the facing surface joins the side surfaces of the grooving part are formed such that each corner has a beveled surface portion.

Cutting tool for simultaneous facing and grooving of CMP pad

Growing community of inventors

Berkeley, CA, United States of America

Ichiro Kodaka