Ichiro Ishikawa

Title: Ichiro Ishikawa: A Pioneer in EUV Lithography Innovations

Introduction

Ichiro Ishikawa is a notable inventor based in Tokyo, Japan, recognized for his contributions to the field of extreme ultraviolet (EUV) lithography. With a portfolio that includes 9 patents, he has significantly advanced the technology that underpins modern semiconductor manufacturing. His inventions focus on the development of reflective masks and related methodologies that enhance the precision and efficiency of lithographic processes.

Latest Patents

Ishikawa's recent patents are centered around reflective mask technology, which is critical in EUV lithography. Notable patents include the following inventions:

1. Reflective mask blank

2. Reflective mask

3. Method of manufacturing reflective mask blank

4. Method of manufacturing reflective mask

His patents describe a reflective mask blank that contains a substrate, a multilayer reflective film designed to reflect EUV light, and a phase shift film that optimally shifts the phase of the EUV light. The phase shift film incorporates a compound with both ruthenium (Ru) and chromium (Cr), demonstrating an element ratio of Cr to Ru ranging from 5:95 to 42:58. Furthermore, the patents detail specific melting points of these materials, providing essential guidelines for manufacturing processes.

Career Highlights

Throughout his esteemed career, Ichiro Ishikawa has been associated with leading firms in the semiconductor industry, specifically Agc Inc. and Sente Creations Co., Ltd. His work in these organizations has positioned him as a key figure in advancing lithographic technology, directly impacting the efficiency and effectiveness of semiconductor fabrication.

Collaborations

Ishikawa has collaborated with numerous talented individuals in the field, including Daijiro Akagi and Kenichi Sasaki. These collaborations have fostered innovation and have contributed to significant advancements in the development of cutting-edge technologies and methodologies within the realm of EUV lithography.

Conclusion

In conclusion, Ichiro Ishikawa's innovative contributions to EUV lithography through his patents and collaborative efforts exemplify his commitment to enhancing semiconductor technology. His work not only reflects his expertise as an inventor but also underscores the importance of research and development in creating solutions that drive the industry forward.