The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2025
Filed:
Oct. 20, 2023
Applicant:
Agc Inc., Tokyo, JP;
Inventors:
Shunya Taki, Tokyo, JP;
Hiroaki Iwaoka, Tokyo, JP;
Daijiro Akagi, Tokyo, JP;
Ichiro Ishikawa, Tokyo, JP;
Assignee:
AGC Inc., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/26 (2012.01); G03F 1/24 (2012.01); G03F 1/48 (2012.01); G03F 1/80 (2012.01);
U.S. Cl.
CPC ...
G03F 1/26 (2013.01); G03F 1/24 (2013.01); G03F 1/48 (2013.01); G03F 1/80 (2013.01);
Abstract
A reflective mask blank containing a substrate, a multilayer reflective film that reflects EUV light, and a phase shift film that shifts a phase of the EUV light, the substrate, the multilayer reflective film, and the phase shift film being arranged in this order. The phase shift film contains a compound containing Ru and Cr, an element ratio between Cr and Ru (Cr:Ru) in the phase shift film is 5:95 to 42:58, and a melting point MP1 of an oxide of the compound and a melting point MP2 of a fluoride or an oxyfluoride of the compound satisfy the following relation (1):0.625MP1+MP2≤1000 (1).