Company Filing History:
Years Active: 2003-2009
Title: I-Pien Wu: Innovator in Lithography and Cooling Systems
Introduction
I-Pien Wu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the fields of lithography and cooling systems, holding a total of 5 patents. His work has been instrumental in advancing technology in these areas.
Latest Patents
One of I-Pien Wu's latest patents is a method for analyzing overlay errors in lithography. This method involves conducting interfield and intrafield sampling to measure overlay error values at multiple positions on wafers. The overlay error model he developed includes coefficients for various types of intrafield and interfield overlay errors, such as translation, magnification, rotation, and orthogonality errors. Another significant patent is for a cooling system designed for a hot plate. This system features multiple pipelines that allow a cooling fluid to enter and exit, effectively removing heat from the hot plate to maintain optimal operating temperatures.
Career Highlights
I-Pien Wu is currently employed at Macronix International Co., Ltd., where he continues to innovate and develop new technologies. His expertise in lithography and cooling systems has made him a valuable asset to the company.
Collaborations
Throughout his career, I-Pien Wu has collaborated with talented individuals such as Chi-Yuan Hung and Ching-Yu Chang. These collaborations have further enhanced his work and contributed to the success of various projects.
Conclusion
I-Pien Wu's contributions to the fields of lithography and cooling systems demonstrate his innovative spirit and technical expertise. His patents reflect a commitment to advancing technology and improving processes in these critical areas.