I-Cheng Chen

Title: I-Cheng Chen: Innovator in Chemical Vapor Deposition Technologies

Introduction

I-Cheng Chen is a prominent inventor based in San Jose, CA, known for his significant contributions to the field of chemical vapor deposition. With a total of four patents to his name, Chen has made strides in enhancing the selectivity of titanium and titanium silicides during deposition processes. His work is crucial for advancements in semiconductor manufacturing and materials science.

Latest Patents

Chen's latest patents focus on methods and apparatus for selectively depositing titanium material layers atop substrates with silicon and dielectric surfaces. These patents describe an innovative apparatus designed to facilitate a remote plasma reaction involving titanium tetrachloride (TiCl), hydrogen (H), and argon (Ar). The process occurs within a temperature range of 200 to 800 degrees Celsius, allowing for the selective formation of titanium layers on silicon surfaces, which is essential for various applications in electronics.

Career Highlights

I-Cheng Chen is currently employed at Applied Materials, Inc., a leading company in the semiconductor and materials engineering industry. His work at Applied Materials has positioned him as a key player in developing advanced deposition technologies that enhance manufacturing efficiency and product performance.

Collaborations

Throughout his career, Chen has collaborated with notable colleagues, including Takashi Kuratomi and Avgerinos V Gelatos. These collaborations have fostered innovation and contributed to the successful development of new technologies in the field.

Conclusion

I-Cheng Chen's contributions to chemical vapor deposition technologies have significantly impacted the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in materials science and manufacturing processes.