Hyunseop Shin

Title: Hyunseop Shin: Innovator in Semiconductor Technology

Introduction

Hyunseop Shin is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of compositions for removing photoresists.

Latest Patents

Hyunseop Shin holds 2 patents. His latest patent focuses on compositions for removing photoresists and methods of manufacturing semiconductor devices and semiconductor packages using these compositions. The photoresist-removing composition includes a polar organic solvent, an alkyl ammonium hydroxide, an aliphatic amine that does not include a hydroxy group, and a monovalent alcohol. To manufacture a semiconductor device, a photoresist pattern is formed on a substrate, and the photoresist-removing composition is then applied to this pattern. For semiconductor packages, a photoresist pattern with multiple via holes is created on a substrate, where conductive posts made of metal are formed inside these holes. The photoresist pattern is subsequently removed using the innovative photoresist-removing composition, allowing a semiconductor chip to be adhered to the substrate between the conductive posts.

Career Highlights

Hyunseop Shin has worked with prominent companies in the industry, including Samsung Electronics Co., Ltd. and Kpx Chemical Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Some of his notable coworkers include Hyojin Yun and Seungwon Kim. Their collaboration has likely played a role in advancing the projects they have worked on together.

Conclusion

Hyunseop Shin is a distinguished inventor whose work in semiconductor technology has led to valuable innovations. His contributions continue to impact the industry positively.