Hyungjun Noh

Title: Hyungjun Noh: Innovator in Integrated Circuit Technology

Introduction

Hyungjun Noh is a prominent inventor based in Suwon-si, South Korea. He is known for his contributions to the field of integrated circuit technology. His innovative work has led to the development of advanced devices that enhance electronic performance.

Latest Patents

Hyungjun Noh holds a patent for an integrated circuit device with ion-doped regions that provide dopant ions to gate dielectric film. This integrated circuit device includes a substrate with active regions, a device isolation film defining these regions, and a word line arranged over them. The design features a gate dielectric film positioned between the substrate and the word line, with specific dimensions that optimize performance. The manufacturing process involves implanting dopant ions into the substrate and device isolation film, followed by a reduction in the thickness of a portion of the impurity region.

Career Highlights

Hyungjun Noh is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of integrated circuit design. His work has significantly impacted the efficiency and functionality of electronic devices.

Collaborations

He has collaborated with notable colleagues, including Junsoo Kim and Dongsoo Woo, contributing to various projects that advance technology in the electronics sector.

Conclusion

Hyungjun Noh's innovative contributions to integrated circuit technology exemplify the importance of research and development in the electronics industry. His patent and ongoing work at Samsung Electronics Co., Ltd. highlight his role as a key figure in advancing electronic device performance.