Hyun-Sang Joo

Title: Hyun-Sang Joo: Innovator in Chemically Amplified Resist Compositions

Introduction

Hyun-Sang Joo is a prominent inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of chemically amplified resist compositions, holding a total of 4 patents. His work is crucial in advancing technologies related to photolithography and semiconductor manufacturing.

Latest Patents

One of his latest patents involves an acid generating agent for chemically amplified resist compositions. This agent is represented by a specific formula and includes an onium salt compound. Additionally, he has developed a polymer compound that comprises this salt compound, which is essential for creating a chemically amplified resist composition. This composition is sensitive to far-ultraviolet radiation, specifically represented by KrF excimer laser or ArF excimer laser.

Career Highlights

Hyun-Sang Joo is currently employed at Korea Kumho Petrochemical Co., Ltd. His innovative work in the field has positioned him as a key figure in the development of advanced materials for the semiconductor industry. His patents reflect his commitment to enhancing the efficiency and effectiveness of resist compositions used in photolithography.

Collaborations

Throughout his career, Joo has collaborated with notable colleagues, including Joo-Hyeon Park and Young-Taek Lim. These collaborations have further enriched his research and development efforts, leading to groundbreaking advancements in his field.

Conclusion

Hyun-Sang Joo's contributions to chemically amplified resist compositions demonstrate his expertise and innovative spirit. His patents and collaborations highlight his significant role in the advancement of semiconductor technologies.