The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2007
Filed:
Sep. 14, 2004
Young-taek Lim, Cheunan, KR;
Joo-hyeon Park, Cheunan, KR;
Dong-chul Seo, Cheunan, KR;
Chang-min Kim, Cheunan, KR;
Seong-duk Cho, Asan, KR;
Hyun-sang Joo, Asan, KR;
Young-Taek Lim, Cheunan, KR;
Joo-Hyeon Park, Cheunan, KR;
Dong-Chul Seo, Cheunan, KR;
Chang-Min Kim, Cheunan, KR;
Seong-Duk Cho, Asan, KR;
Hyun-Sang Joo, Asan, KR;
Abstract
A chemically amplified resist composition includes a novel polymer, a photoacid generator, and a solvent. The chemically amplified resist can form a resist pattern that is excellent in adhesiveness with a low dependency to the substrate, transparency at the far ultraviolet wavelength range such as KrF Excimer laser or ArF Excimer laser, dry etch resistance, sensitivity, resolution, and developability. In addition, the polymer contains a maximum number of saturated aliphatic rings to enhance etching resistance, and additionally includes an alkoxyalkyl acrylate monomer introduced as a solution to the problem with the conventional polyacrylate resist in regard to edge roughness of the pattern, to form a uniform edge of the pattern because the alkylalcohol compound generated together with a formaldehyde and a carboxylate compound by a deprotection reaction of the alkoxyalkyl acrylate monomer with an acid acts as a solvent or an antifoaming agent in the pattern.