Chang-Min Kim

Title: Chang-Min Kim: Innovator in Polymer Chemistry

Introduction

Chang-Min Kim is a notable inventor based in Cheonan, South Korea. He has made significant contributions to the field of polymer chemistry, particularly in the development of advanced resist compositions for photolithography.

Latest Patents

Chang-Min Kim holds two patents, with his latest innovations focusing on a polymer and chemically amplified resist composition. This composition includes a novel polymer, a photoacid generator, and a solvent. The chemically amplified resist is designed to form a resist pattern that exhibits excellent adhesiveness with low dependency on the substrate. It also demonstrates transparency in the far ultraviolet wavelength range, such as KrF Excimer laser or ArF Excimer laser, along with dry etch resistance, sensitivity, resolution, and developability. Furthermore, the polymer is engineered to contain a maximum number of saturated aliphatic rings to enhance etching resistance. It incorporates an alkoxyalkyl acrylate monomer to address issues related to edge roughness in conventional polyacrylate resists, ensuring a uniform edge pattern.

Career Highlights

Chang-Min Kim is currently employed at Korea Kumho Petrochemical Co., Ltd., where he continues to innovate in the field of polymer chemistry. His work has been instrumental in advancing the capabilities of resist materials used in semiconductor manufacturing.

Collaborations

He has collaborated with notable colleagues, including Young-Taek Lim and Joo-Hyeon Park, contributing to the success of various projects within his company.

Conclusion

Chang-Min Kim's contributions to polymer chemistry and resist technology have positioned him as a key figure in the industry. His innovative patents reflect his commitment to advancing the field and addressing challenges in photolithography.