The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2008
Filed:
Apr. 18, 2005
Hyun-sang Joo, Chungcheongnam-do, KR;
Joo-hyeon Park, Chungcheongnam-do, KR;
Dong-chul Seo, Chungcheongnam-do, KR;
Young-taek Lim, Chungcheongnam-do, KR;
Seong-duk Cho, Gwangju-si, KR;
Ji-young Song, Chungcheongnam-do, KR;
Kyoung-mun Kim, Chungcheongnam-do, KR;
Hyun-Sang Joo, Chungcheongnam-do, KR;
Joo-Hyeon Park, Chungcheongnam-do, KR;
Dong-Chul Seo, Chungcheongnam-do, KR;
Young-Taek Lim, Chungcheongnam-do, KR;
Seong-Duk Cho, Gwangju-si, KR;
Ji-Young Song, Chungcheongnam-do, KR;
Kyoung-Mun Kim, Chungcheongnam-do, KR;
Korea Kumho Petrochemical Co., Ltd., Chongno-gu Seoul, KR;
Abstract
The present invention provides a polymer represented by the following formula 1 and a chemically amplified resist composition including the polymer, which resist composition is excellent in adhesion, storage stability and dry etch resistance, with good resolution in both C/H and L/S patterns, and provides a good pattern profile irrespective of the type of the substrate due to its good process window: