The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2012
Filed:
Jan. 15, 2009
Hyun-sang Joo, Daejeongwangyeok-si, KR;
Joo-hyeon Park, Cheonan-si, KR;
Jung-hoon OH, Cheonan-si, KR;
Dae-hyeon Shin, Seoul, KR;
Hyun-Sang Joo, Daejeongwangyeok-si, KR;
Joo-Hyeon Park, Cheonan-si, KR;
Jung-Hoon Oh, Cheonan-si, KR;
Dae-Hyeon Shin, Seoul, KR;
Korea Kumho Petrochemical Co., Ltd., Seoul, KR;
Abstract
A compound represented by the following formula (1) is provided: wherein Rrepresents a hydrogen atom, a trifluoromethyl group, an alkyl group, or an alkoxy group; and A represents a group represented by the following formula (2) or formula (3): wherein R, R, R, Rand Reach independently represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted allyl group, a substituted or unsubstituted perfluoroalkyl group, a substituted or unsubstituted benzyl group, or a substituted or unsubstituted aryl group; and two or more of R, Rand Rmay be linked to each other to form a saturated or unsaturated carbon ring or a saturated or unsaturated heterocyclic ring. The chemically amplified resist composition comprising a polymer compound which is produced from the compound of formula 1 according to the present invention provides a chemically amplified resist sensitive to far-ultraviolet radiation, which is represented by KrF excimer laser or ArF excimer laser.