Dae-Hyeon Shin

Title: Dae-Hyeon Shin: Innovator in Polymer Chemistry

Introduction

Dae-Hyeon Shin is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of polymer chemistry, particularly in the development of advanced materials for various applications. His innovative work has led to the filing of a patent that showcases his expertise and creativity.

Latest Patents

Dae-Hyeon Shin holds a patent for an "Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition." This invention includes a compound represented by a specific formula, where R can be a hydrogen atom, a trifluoromethyl group, an alkyl group, or an alkoxy group. The patent also describes a chemically amplified resist composition that is sensitive to far-ultraviolet radiation, which is essential for advanced lithography techniques.

Career Highlights

Dae-Hyeon Shin is currently employed at Korea Kumho Petrochemical Co., Ltd., where he continues to push the boundaries of polymer research. His work has been instrumental in developing materials that enhance the performance of various chemical processes and applications.

Collaborations

Throughout his career, Dae-Hyeon Shin has collaborated with notable colleagues, including Hyun-Sang Joo and Joo-Hyeon Park. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Dae-Hyeon Shin's contributions to polymer chemistry and his innovative patent demonstrate his commitment to advancing technology in this field. His work not only highlights his expertise but also sets the stage for future developments in polymer applications.