Hwaseong, South Korea

Hyoeun Jung

This inventor holds 2 USPTO granted patents and 4 published patent applications. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2024-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hyoeun Jung. Retrieved from https://idiyas.com/inventor/hyoeun-jung

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2024-2026

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2 patents (USPTO):Explore Patents

Title: Hyoeun Jung: Innovator in Damage Modeling Technology

Introduction

Hyoeun Jung is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of damage modeling technology, particularly in relation to crystal structures. His innovative approach has led to the development of a unique patent that addresses the complexities of modeling damages caused by incident particles.

Latest Patents

Hyoeun Jung holds a patent for a "System and method for modeling damages caused by incident particles." This method involves several key steps, including obtaining particle and crystal information, estimating energy loss of the incident particle, and determining the volume of a vacancy based on that energy loss. Furthermore, it estimates vacancy reactions and generates output data that quantifies the damages incurred.

Career Highlights

Hyoeun Jung is currently employed at Samsung Electronics Co., Ltd., where he applies his expertise in damage modeling. His work at this leading technology company has allowed him to contribute to advancements in materials science and engineering.

Collaborations

Hyoeun has collaborated with talented coworkers, including Sangwoon Lee and Joohyun Jeon. Their combined efforts have fostered a productive environment for innovation and research.

Conclusion

Hyoeun Jung's contributions to damage modeling technology exemplify the impact of innovative thinking in the field of materials science. His patent reflects a significant advancement that can enhance our understanding of crystal damage mechanisms.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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