Hyeong Keun Kim

Title: Hyeong Keun Kim: Innovator in Extreme Ultraviolet Lithography

Introduction

Hyeong Keun Kim is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of extreme ultraviolet lithography, holding a total of 10 patents. His work focuses on developing advanced pellicles that enhance the lithography process used in semiconductor manufacturing.

Latest Patents

Among his latest patents, Hyeong Keun Kim has developed a pellicle for extreme ultraviolet lithography. This application relates to a pellicle used in a lithography process utilizing extreme ultraviolet rays. One aspect of this pellicle includes a pellicle layer formed of an M-α material, where M is combined with α. M can be one of several materials, including Si, Zr, Mo, Ru, Y, W, Ti, Ir, or Nb, while α consists of at least two elements from B, N, C, O, or F. Another notable patent involves a pellicle for extreme ultraviolet lithography containing molybdenum carbide. This pellicle features a substrate with an opening in the central portion and a pellicle layer that covers the opening, including a molybdenum carbide containing layer expressed as MoC(0

Career Highlights

Hyeong Keun Kim is affiliated with the Korea Electronics Technology Institute, where he continues to innovate in the field of electronics and lithography. His expertise and research have positioned him as a key figure in advancing technologies that are critical for modern semiconductor fabrication.

Collaborations

Hyeong Keun Kim has collaborated with several talented individuals, including Hyun Mi Kim and Seul Gi Kim. These collaborations have fostered a productive environment for innovation and development in their respective fields.

Conclusion

Hyeong Keun Kim's contributions to extreme ultraviolet lithography demonstrate his commitment to advancing technology in the semiconductor industry. His innovative patents and collaborations highlight his role as a leading inventor in this critical area of research.