The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2024
Filed:
Nov. 29, 2021
Applicant:
Korea Electronics Technology Institute, Seongnam-si, KR;
Inventors:
Hyeong Keun Kim, Yongin-si, KR;
Seul Gi Kim, Yongin-si, KR;
Hyun Mi Kim, Seoul, KR;
Jin Woo Cho, Seoul, KR;
Ki Hun Seong, Anyang-si, KR;
Assignee:
Korea Electronics Technology Institute, Seongnam-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/64 (2012.01); G03F 1/62 (2012.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/62 (2013.01); G03F 7/11 (2013.01); G03F 7/2004 (2013.01);
Abstract
A pellicle for extreme ultraviolet (EUV) lithography is based on yttrium carbide and used in a EUV lithography process. The pellicle for EUV lithography includes a pellicle layer that has a core layer containing yttrium carbide. The yttrium carbide is YCin which the atomic percentage of carbon is within a range of 25% to 45%.