The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2022
Filed:
Nov. 09, 2021
Applicant:
Korea Electronics Technology Institute, Seongnam-si, KR;
Inventors:
Hyeong Keun Kim, Yongin-si, KR;
Hyun Mi Kim, Seoul, KR;
Jin Woo Cho, Seoul, KR;
Seul Gi Kim, Yongin-si, KR;
Ki Hun Seong, Anyang-si, KR;
Assignee:
Korea Electronics Technology Institute, Seongnam-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 1/62 (2012.01);
U.S. Cl.
CPC ...
G03F 7/70983 (2013.01); G03F 1/62 (2013.01); G03F 7/70033 (2013.01);
Abstract
A pellicle for extreme ultraviolet lithography has an extreme ultraviolet transmittance of 90% or more and also has thermal stability, mechanical stability, and chemical durability. The pellicle includes a support layer and a pellicle layer. The support layer has an opening formed in a central portion thereof. The pellicle layer is formed on the support layer to cover the opening and includes ZrB(2<x<16).