Cheonan-si, South Korea

Hyeon Gyu Kim

USPTO Granted Patents = 3 

Average Co-Inventor Count = 6.4

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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3 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Hyeon Gyu Kim and His Contributions to Plasma Technology

Introduction: Hyeon Gyu Kim, an inventive mind based in Cheonan-si, South Korea, has made notable strides in the field of substrate treatment through his groundbreaking patents. With a total of two patents to his name, Kim showcases a blend of creativity and technical prowess that is instrumental in advancing plasma technology.

Latest Patents: Hyeon Gyu Kim's latest innovations include the "Substrate Treating Apparatus" and the "Substrate Support Unit." The substrate support unit is designed for use in apparatuses that treat substrates with plasma. This invention features a dielectric plate for substrate placement, a lower electrode with a designated diameter, and a power supply rod that applies RF power to the lower electrode. Furthermore, a ground member is strategically placed beneath the electrode to optimize performance, enhancing the treatment process for substrates. His other patent, “Support Unit and Substrate Treating Apparatus Including the Same,” emphasizes the importance of precise spacing and structure to improve the efficiency of plasma treatment.

Career Highlights: Hyeon Gyu Kim is currently affiliated with Semes Co., Ltd., where he continues to develop and refine technologies essential for substrate treatment. His work contributes significantly to optimizing processes within the semiconductor industry and enhancing overall product quality.

Collaborations: Throughout his career, Kim has collaborated with notable colleagues, including Hyoungkyu Son and Yu Dong Han. Together, they contribute to the dynamic research environment at Semes Co., Ltd., sharing knowledge and expertise that propel innovations in their field.

Conclusion: Hyeon Gyu Kim exemplifies the essence of innovation within the realm of substrate treatment technologies. His latest patents reflect a commitment to improving industrial processes and showcasing the potential of plasma technology. As his work continues to evolve, Kim's contributions will undoubtedly influence the future landscape of this critical industry.

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