The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2024
Filed:
Jul. 01, 2020
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Hyoungkyu Son, Seoul, KR;
Yu Dong Han, Daejeon, KR;
Hyeon Gyu Kim, Cheonan-si, KR;
Seon Ok Kim, Asan-si, KR;
Assignee:
SEMES CO., LTD., Chungcheongnam-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/683 (2006.01); H01J 37/20 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); H01J 37/32082 (2013.01); H01J 37/32532 (2013.01); H01J 37/32715 (2013.01); H01L 21/683 (2013.01); H01J 2237/334 (2013.01);
Abstract
A support unit provided in an apparatus for treating a substrate using plasma includes a dielectric plate on which the substrate is placed, an electrode plate disposed under the dielectric plate, a power supply rod that applies power to the electrode plate, and a flange that has a shape surrounding the power supply rod and that is spaced apart from the power supply rod.