The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2025
Filed:
Aug. 06, 2021
Semes Co., Ltd., Chungcheongnam-do, KR;
Hyoungkyu Son, Seoul, KR;
Jong-Hwan An, Yongin-si, KR;
Jae Hyun Cho, Suwon-si, KR;
Min Keun Bae, Cheonan-si, KR;
Dong Suk Kim, Hwaseong-si, KR;
Hyeon Gyu Kim, Cheonan-si, KR;
Ogsen Galstyan, Cheonan-si, KR;
Won Seok Lee, Seoul, KR;
Sung Je Kim, Hwaseong-si, KR;
SEMES CO., LTD., Chungcheongnam-Do, KR;
Abstract
The inventive concept relates to a substrate support unit provided in an apparatus for treating a substrate using plasma. In an embodiment, the substrate support unit includes a dielectric plate on which the substrate is placed, a lower electrode that is disposed under the dielectric plate and that has a first diameter, a power supply rod that applies RF power to the lower electrode and has a second diameter, and a ground member disposed under the lower electrode and spaced apart from the lower electrode by a first gap by an insulating member, the ground member including a plate portion having a through-hole formed therein through which the power supply rod passes, in which the through-hole has a third diameter.