The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2025
Filed:
Dec. 08, 2021
Semes Co., Ltd., Chungcheongnam-do, KR;
Hyoungkyu Son, Seoul, KR;
Jong-Hwan An, Gyeonggi-do, KR;
Jae Hyun Cho, Gyeonggi-do, KR;
Min Keun Bae, Chungcheongnam-do, KR;
Ogsen Galstyan, Chungcheongnam-do, KR;
Dong Suk Kim, Gyeonggi-do, KR;
Hyeon Gyu Kim, Chungcheongnam-do, KR;
Won Seok Lee, Seoul, KR;
Sung Je Kim, Gyeonggi-dO, KR;
SEMES CO., LTD., Chungcheongnam-Do, KR;
Abstract
Provided is a support unit included in an apparatus for treating a substrate using plasma and configured to support the substrate. The support unit may include a power supply rod connected to a high-frequency power supply; an electrode plate configured to receive power from the power supply rod; and a ground ring provided to surround the electrode plate when viewed from the top and including a ground ring to be grounded.