Company Filing History:
Years Active: 2010-2011
Title: Huo-Tieh Lu: Innovator in Semiconductor Technology
Introduction
Huo-Tieh Lu is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of innovative structures and methods for MOS transistors. With a total of 2 patents to his name, Lu continues to push the boundaries of what is possible in electronic design.
Latest Patents
Huo-Tieh Lu's latest patents include a "Conductive structure having capacitor" and a "Method of forming strain-causing layer for MOS transistors and process for fabricating strained MOS transistors." The first patent describes a three-dimensional conductive structure that incorporates a capacitor with a unique design, allowing signal lines to traverse the capacitor space without detours. This innovation enhances signal transfer efficiency in electronic devices. The second patent outlines a method for creating a strain-causing layer for MOS transistors, which improves their performance by utilizing a non-conformal stressed film. This method allows for the precise fabrication of strained MOS transistors, which are crucial for advanced semiconductor applications.
Career Highlights
Huo-Tieh Lu is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in technology.
Collaborations
Some of Huo-Tieh Lu's notable coworkers include Tsuoe-Hsiang Liao and Chih-Chien Liu. Their collaborative efforts have further enhanced the innovative projects they undertake, leading to significant advancements in semiconductor technology.
Conclusion
Huo-Tieh Lu is a distinguished inventor whose work in semiconductor technology has led to valuable patents and innovations. His contributions continue to shape the future of electronic design and manufacturing.