The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2010
Filed:
Oct. 29, 2007
Huo-tieh LU, Taipei, TW;
Jin-sheng Yang, Hsinchu, TW;
Pei-lin Kuo, Taichung, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A method of forming a strain-causing layer for MOS transistors is provided, which is applied to a substrate having a plurality of gate structures of the MOS transistors thereon. A non-conformal stressed film that is thicker on the gate structures than between the gate structures is formed over the substrate. The non-conformal stressed film is then etched, without an etching mask thereon, to remove portions thereof between the gate structures and disconnect the stressed film between the gate structures. At least one extra stressed film may be further formed over the substrate, wherein each extra stressed film has the same type of stress as the above stressed film and is connected or disconnected between the gate structures.