Hungyueh Lu

Title: Innovations of Inventor Hungyueh Lu

Introduction

Hungyueh Lu is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor fabrication, holding 2 patents that showcase his innovative approaches to cleaning methods in this industry.

Latest Patents

One of his latest patents is a dry cleaning method that replaces traditional wet cleaning after metal etching. This method involves cleaning an etched metallization structure by introducing a fluorine-containing gas and an oxygen-containing gas mixture into a processing chamber. The process is conducted without the use of a downstream microwave while applying a magnetic field and maintaining a pressure of less than about 50 millitorr for a predetermined time. Another significant patent is a post-cleaning method of a via etching process. This method is designed for cleaning a wafer that has a tungsten layer, an oxide layer, and a patterned photoresist layer. The cleaning process includes a photoresist strip process, a dry cleaning process using CF and NH as the main reactive gases, and a water-rinsing process.

Career Highlights

Hungyueh Lu is currently employed at Promos Technologies, Inc., where he continues to develop innovative solutions in semiconductor technology. His work has been instrumental in advancing cleaning techniques that enhance the efficiency and effectiveness of semiconductor fabrication processes.

Collaborations

He collaborates with talented coworkers, including Hong-Long Chang and Fang-Fei Liu, who contribute to the innovative environment at Promos Technologies, Inc.

Conclusion

Hungyueh Lu's contributions to semiconductor fabrication through his innovative cleaning methods demonstrate his expertise and commitment to advancing technology in this field. His patents reflect a deep understanding of the challenges in semiconductor processing and offer practical solutions that benefit the industry.