The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2002
Filed:
Apr. 11, 2001
Applicant:
Inventors:
Assignee:
ProMOS Technologies Inc., Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ; H01L 2/14763 ;
U.S. Cl.
CPC ...
H01L 2/1302 ; H01L 2/14763 ;
Abstract
A post-cleaning method of a via etching process for cleaning a wafer, the wafer having a tungsten (W) layer, an oxide layer covered on the tungsten layer, a photoresist layer patterned on the oxide layer, and a via passing through the photoresist layer and the oxide layer until a predetermined area of the tungsten layer is exposed, the cleaning method has the steps of: (a) performing a photoresist strip process to remove the photoresist layer; (b) performing a dry cleaning process which uses CF and N H as the main reactive gas; and (c) performing a water-rinsing process.