Hung V Pham

Title: Innovations of Inventor Hung V Pham

Introduction

Hung V Pham is a notable inventor based in San Jose, California. He has made significant contributions to the field of imaging metrology and optical measurement technologies. With a total of five patents to his name, his work reflects a commitment to advancing the capabilities of measurement systems.

Latest Patents

One of Hung V Pham's latest inventions is the "Wafer Metrology Apparatus and Method." This invention is an apparatus for imaging metrology, which may be integrated with a processor station, allowing the metrology station to be apart from but coupled to a process station. The metrology station is equipped with a first imaging camera that has a field of view containing the measurement region. Alternate embodiments may include a second imaging camera with a different field of view. Preferred embodiments utilize a broadband ultraviolet light source, although other embodiments may employ visible or near-infrared light sources. The design typically includes a spectrograph or an imaging spectrograph, and may feature curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have four degrees of freedom of movement relative to each other.

Another significant patent is the "Broadband Microspectro-Reflectometer." This invention provides an improved method and apparatus for measuring the relative reflectance spectra of an observed sample. A broadband visible and ultraviolet beam is split into a sample beam and a reference beam. The sample beam is reflected off the surface of the sample, and the spectrum of the reflected sample beam is compared to that of the reference beam to determine the relative reflectance spectrum. The system includes a video camera for viewing the sample, and an autofocus system with both course-focus and fine-focus modes.

Career Highlights

Hung V Pham has worked with prominent companies in the technology sector, including Prometrix Corporation and KLA-Tencor Corporation. His experience in these organizations has contributed to his expertise in metrology and optical systems.

Collaborations

Some of his notable coworkers include Adam Eales Norton and Chester L Mallory. Their collaboration has likely fostered innovation and development in their respective fields.

Conclusion

Hung V Pham's contributions to imaging metrology and optical measurement technologies are significant. His innovative patents demonstrate a deep understanding of the complexities involved in measurement systems. His