The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2005
Filed:
Mar. 26, 2003
Fred E. Stanke, Cupertino, CA (US);
Clinton B. Carlisle, Palo Alto, CA (US);
Hung Van Pham, San Jose, CA (US);
Edric Tong, Sunnyvale, CA (US);
Douglas E. Ruth, Sunnyvale, CA (US);
James M. Cahill, Jr., San Jose, CA (US);
Michael Weber-grabau, Sunnyvale, CA (US);
Elliot Burke, Goleta, CA (US);
Adam E. Norton, Palo Alto, CA (US);
Fred E. Stanke, Cupertino, CA (US);
Clinton B. Carlisle, Palo Alto, CA (US);
Hung Van Pham, San Jose, CA (US);
Edric Tong, Sunnyvale, CA (US);
Douglas E. Ruth, Sunnyvale, CA (US);
James M. Cahill, Jr., San Jose, CA (US);
Michael Weber-Grabau, Sunnyvale, CA (US);
Elliot Burke, Goleta, CA (US);
Adam E. Norton, Palo Alto, CA (US);
Therma-Wave, Inc., Fremont, CA (US);
Abstract
This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.