Company Filing History:
2 out of 58,131 
2 out of 106 
1 out of 161 
Years Active: 1999-2001
Title: The Innovative Contributions of Hung-Lee Hoo
Introduction
Hung-Lee Hoo is a notable inventor based in Livingston, NJ (US), recognized for his significant contributions to the field of materials science and engineering. With a total of 3 patents, he has made strides in developing advanced sputter targets that enhance the efficiency of magnetic thin film applications.
Latest Patents
One of his latest patents is titled "High magnetic flux sputter targets with varied magnetic permeability in selected regions." This invention provides a planar ferromagnetic sputter target designed for use as a cathode in magnetron sputtering. The ferromagnetic material features localized regions with differing magnetic permeability, which guides the magnetic flux flow and increases the magnetic leakage flux at the sputtering surface. Another significant patent is "Manufacturing of high density intermetallic sputter targets." This method involves fabricating intermetallic sputter targets by blending elemental powders and synthesizing them under specific conditions to achieve a final density greater than 90% of theoretical density. This innovative approach improves the microstructure of the sputter targets and eliminates contamination risks.
Career Highlights
Hung-Lee Hoo has worked with prominent companies such as Sony Corporation and Materials Research Corporation. His experience in these organizations has allowed him to refine his expertise in materials development and patent innovation.
Collaborations
Some of his notable coworkers include Wei Xiong and Peter McDonald, who have contributed to his research and development efforts.
Conclusion
Hung-Lee Hoo's innovative work in the field of sputter targets has significantly advanced the technology used in magnetic thin films. His patents reflect a deep understanding of materials science and a commitment to enhancing manufacturing processes.