This inventor holds 3 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2000-2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000-2002
Title: Innovator Huey-Liang Hwang: Pioneering ESD Protection Solutions
Introduction
Huey-Liang Hwang, a distinguished inventor based in Hsin-Chu, Taiwan, has made significant contributions to the field of semiconductor technology. With a total of three patents to his name, Hwang specializes in innovative solutions that enhance the reliability and performance of electronic devices.
Latest Patents
Hwang's latest patents focus on effective Electrostatic Discharge (ESD) protection devices. One of his significant inventions is an ESD protection device structure that, when connected between an input/output pad on a semiconductor substrate and a reference voltage source, safeguards internal circuits from overstress due to excessively high voltages from ESD voltage sources. This structure is designed to maintain a uniform discharge current, ensuring increased protection for internal circuits and preventing damage to the ESD protection device.
Additionally, he has developed a method of fabricating an ESD protection device that shares similar functionalities and mechanics as the previously mentioned patent. The innovative aspects of this device include source regions acting as emitters of parasitic transistors, drain regions as collectors, and gate electrodes that are strategically formed to create a variable length of the channel region. This design leads to a uniformly distributed ESD current across the protection structure.
Career Highlights
Huey-Liang Hwang is currently associated with Taiwan Semiconductor Manufacturing Company Limited, a prominent leader in semiconductor manufacturing. His work has played a crucial role in enhancing semiconductor device performance, particularly in the realm of ESD protection, which is a critical consideration in the electronics industry.
Collaborations
Throughout his career, Hwang has collaborated with esteemed coworkers, including Jiaw-Ren Shih and Jian-Hsing Lee. These partnerships have helped foster innovation and advance the development of robust semiconductor technologies.
Conclusion
With a solid foundation in ESD protection technologies and a commitment to innovation, Huey-Liang Hwang continues to push the boundaries of semiconductor design. His contributions not only strengthen the integrity of electronic devices but also pave the way for future advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile