Wuxi New District, China

Huatang Lin


Average Co-Inventor Count = 8.2

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Jiangsu, CN (2018)
  • Wuxi New District, CN (2019)

Company Filing History:


Years Active: 2018-2019

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2 patents (USPTO):Explore Patents

Title: **Innovator Spotlight: Huatang Lin**

Introduction

Huatang Lin is a distinguished inventor located in Wuxi New District, China. With a robust portfolio comprising two valuable patents, his contributions to the field of semiconductor technology are noteworthy. His experience and innovation serve as an inspiration for aspiring inventors and professionals within the tech industry.

Latest Patents

Huatang Lin's latest patents focus on advanced semiconductor devices. The first is titled "Laterally diffused metal oxide semiconductor field-effect transistor and manufacturing method therefor." This invention outlines a method that includes forming a high-temperature oxidation film, employing photoetching and dry etching techniques, and performing ion injection to create the semiconductor components.

The second patent is a "Method for manufacturing laterally insulated-gate bipolar transistor." This innovation details a systematic approach that involves forming various layers on a wafer to create efficient bipolar transistors. The method emphasizes the importance of precise fabrications, such as thermal drive-in processes and ion implantation, which are vital for improving device performance.

Career Highlights

Huatang Lin is currently affiliated with CSMC Technologies Fab2 Co., Ltd. Over the years, he has demonstrated significant expertise in semiconductor manufacturing processes, which has led to his successful patent applications. His technical knowledge and innovative mindset continue to play a crucial role in advancing semiconductor technology.

Collaborations

Throughout his career, Huatang has collaborated with notable colleagues such as Feng Huang and Guangtao Han. These partnerships underscore the collaborative nature of technological innovation, where shared knowledge and expertise often lead to groundbreaking discoveries and patents.

Conclusion

Huatang Lin's contributions to semiconductor technology exemplify the impact of innovation within the industry. Through his patents, he has not only advanced the field but has also inspired future inventors to explore and challenge the boundaries of technology. His career continues to be a testament to the importance of creativity and collaboration in driving progress in the world of inventions.

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