Shanghai, China

Hsusheng Chang

USPTO Granted Patents = 8 

Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2014-2018

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8 patents (USPTO):Explore Patents

Title: Hsusheng Chang: Pioneering Innovator in Semiconductor Technology

Introduction:

Hsusheng Chang is a visionary inventor based in Shanghai, China, whose relentless pursuit of innovation has solidified his position as a true trailblazer in the world of technology. With a total of 8 patents to his name, Chang's creative genius and dedication to creating cutting-edge solutions for the future have inspired countless inventors and researchers to push the boundaries of what is possible.

Latest Patents:

Among his latest patents is the "Method for forming high aspect ratio patterning structure", which revolutionizes the process of creating high aspect ratio patterning structures on semiconductor substrates. By implementing a novel technique involving multiple layers and chemical deposition processes, Chang's invention addresses key challenges such as cone-shaped photoresist morphology and burrs at the edge of the pattern, ensuring more precise and efficient ion implantation in semiconductor devices. Another notable patent is the "Apparatus for detecting the flatness of wafer and the method thereof", which introduces an innovative approach to accurately measure the flatness of silicon wafers and photo-resist layers, essential for semiconductor manufacturing processes.

Career Highlights:

Hsusheng Chang is a valued member of the Shanghai Huali Microelectronics Corporation, where his expertise and innovative spirit have contributed significantly to the company's success in the field of semiconductor technology. His extensive knowledge and experience in developing advanced solutions for semiconductor manufacturing have earned him a reputation as a key player in the industry.

Collaborations:

Throughout his career, Chang has collaborated closely with esteemed coworkers such as Yukun Lv and Jian Ding. Together, they have synergized their talents and expertise to drive forward groundbreaking projects and bring innovative ideas to fruition. Their collaborative efforts have not only yielded remarkable results but also fostered a dynamic and creative work environment.

Conclusion:

In conclusion, Hsusheng Chang's remarkable contributions to the field of semiconductor technology exemplify his unwavering commitment to innovation and excellence. His pioneering inventions and collaborative efforts with industry peers continue to shape the future of technology, setting new standards for inventors and researchers worldwide. As a true visionary in his field, Chang's legacy will undoubtedly inspire generations to come to explore the limitless possibilities of innovation.

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