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For the Inventor, By the Inventor

Scotia, NY, United States of America

Hsueh-Rong Chang

USPTO Granted Patents = 18

Average Co-Inventor Count = 1.9

ph-index = 13

Forward Citations = 1,035(Granted Patents)


Location History:

  • Scotia, NY (US) (1989 - 1995)
  • Schenectady, NY (US) (1995 - 1999)

Company Filing History:

goldMedal18 out of 51,873 
 
General Electric Company
 patents

Years Active: 1989-1999

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18 patents (USPTO):Explore Patents
1. 5866983 - Protective metal silicate coating for electrodeless HID lamps (1999-02-02),
2. 5438244 - Use of silver and nickel silicide to control iodine level in (1995-08-01),
3. 5434482 - Electrodeless fluorescent lamp with optimized amalgam positioning (1995-07-18),
4. 5412289 - Using a magnetic field to locate an amalgam in an electrodeless (1995-05-02),
5. 5343118 - Iodine getter for a high intensity metal halide discharge lamp (1994-08-30),
6. 5270615 - Multi-layer oxide coating for high intensity metal halide discharge lamps (1993-12-14),
7. 5240570 - Surfactant augmented in-situ removal of PCBs from soil by electroosmosis (1993-08-31),
8. 5111253 - Multicellular FET having a Schottky diode merged therewith (1992-05-05),
9. 4994883 - Field controlled diode (FCD) having MOS trench gates (1991-02-19),
10. 4994871 - Insulated gate bipolar transistor with improved latch-up current level (1991-02-19),
11. 4992390 - Trench gate structure with thick bottom oxide (1991-02-12),
12. 4982260 - Power rectifier with trenches (1991-01-01),
13. 4963950 - Metal oxide semiconductor gated turn-off thyristor having an interleaved (1990-10-16),
14. 4961100 - Bidirectional field effect semiconductor device and circuit (1990-10-02),
15. 4942445 - Lateral depletion mode tyristor (1990-07-17),

Title: Hsueh-Rong Chang: Innovator in Electrodeless HID Lamp Technology

Introduction

Hsueh-Rong Chang is a prominent inventor based in Scotia, NY (US), known for his significant contributions to the field of electrodeless high-intensity discharge (HID) lamps. With a total of 18 patents to his name, Chang has made remarkable advancements in lamp technology that enhance performance and longevity.

Latest Patents

One of Chang's latest patents involves a protective metal silicate coating for electrodeless HID lamps. This innovation addresses issues such as sodium loss, free halide build-up, devitrification, and wall etching of the arc chamber. The protective coating is strategically applied to the interior equatorial portion of the arc chamber wall, which is closest to the arc plasma. Suitable coatings include metal silicates derived from metals like scandium, yttrium, beryllium, and rare earth metals. Another notable patent focuses on the use of silver and nickel silicide to control iodine levels in electrodeless high-intensity metal halide discharge lamps. This method improves lamp performance by preventing oxidation of the metal iodide portion of the fill and maintaining arc stability.

Career Highlights

Hsueh-Rong Chang is associated with General Electric Company, where he has played a crucial role in developing innovative lighting solutions. His work has significantly impacted the efficiency and reliability of HID lamps, making them more effective for various applications.

Collaborations

Chang has collaborated with notable colleagues, including Bantval J Baliga and Tat-Sing P Chow, contributing to advancements in lighting technology through teamwork and shared expertise.

Conclusion

Hsueh-Rong Chang's contributions to electrodeless HID lamp technology exemplify his innovative spirit and dedication to improving lighting solutions. His patents reflect a commitment to enhancing performance and reliability in the industry.

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