Hsuan Jung Chang

Title: Hsuan Jung Chang: Innovator in Wafer Processing Technology

Introduction

Hsuan Jung Chang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in wafer processing technology. With a total of 2 patents, Chang's innovations are paving the way for advancements in the industry.

Latest Patents

Chang's latest patents include a pellicle removal tool and a method of utilizing this tool. The dis-pellicle tool features one or more clamp structures, each equipped with a group of pins designed to be inserted into holes within a pellicle frame. This innovative design allows for the effective removal of a pellicle from a photomask, which is crucial for maintaining the quality of semiconductor manufacturing. Additionally, he has developed a wafer processing tool capable of detecting wafer warpage. This tool includes a wafer holder and at least one sensor set, which scans the entire surface of the wafer to measure any warpage while allowing for rotation relative to each other.

Career Highlights

Hsuan Jung Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on enhancing the efficiency and effectiveness of wafer processing techniques, contributing to the overall advancement of semiconductor technology.

Collaborations

Chang has collaborated with several talented individuals in his field, including Chao-Hsiung Yeh and Jen-Ti Wang, who is a prominent female engineer. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Hsuan Jung Chang's contributions to wafer processing technology through his patents and collaborations highlight his role as an influential inventor in the semiconductor industry. His work continues to impact the field positively, driving advancements that benefit the entire sector.