Hsinchu, Taiwan

Hsu-Li Cheng


Average Co-Inventor Count = 3.5

ph-index = 4

Forward Citations = 54(Granted Patents)


Location History:

  • Tainan, TW (1997 - 1998)
  • Tainanhsien, TW (1999)
  • Hsinchu, TW (1999 - 2004)

Company Filing History:


Years Active: 1997-2004

Loading Chart...
6 patents (USPTO):Explore Patents

Title: Hsu-Li Cheng: Innovator in Semiconductor Technology

Introduction

Hsu-Li Cheng is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His innovative methods have advanced the fabrication processes used in integrated circuit devices.

Latest Patents

Cheng's latest patents include a method for forming a polysilicon spacer with a vertical profile. This method involves the deposition of a dielectric layer and a sacrificial layer over a polysilicon layer, followed by a series of steps including chemical mechanical polishing (CMP) to achieve a planarized surface. Another notable patent is for methods of shallow trench isolation, which describes a process for creating self-rounded shallow trench isolation through the careful etching and polishing of layers on a semiconductor substrate.

Career Highlights

Hsu-Li Cheng works at Vanguard International Semiconductor Corporation, where he has played a crucial role in developing advanced semiconductor technologies. His expertise in the field has led to numerous innovations that enhance the performance and efficiency of integrated circuits.

Collaborations

Cheng has collaborated with several talented individuals in his field, including Wei-Ray Lin and Kung Linliu. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Hsu-Li Cheng's contributions to semiconductor technology through his patents and collaborative efforts highlight his importance as an inventor in the industry. His work continues to influence the development of advanced electronic devices.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…