Hsinchu, Taiwan

Hsu-Chieh Cheng

USPTO Granted Patents = 2 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2020-2025

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Hsu-Chieh Cheng and His Contributions to Semiconductor Technology

Introduction: Hsu-Chieh Cheng is an accomplished inventor based in Hsinchu, Taiwan. With a significant patent to his name, he contributes to the rapidly evolving field of semiconductor technology, particularly at Taiwan Semiconductor Manufacturing Company, Ltd. His work focuses on advanced device engineering, specifically FinFET technology, which plays a critical role in modern electronics.

Latest Patents: Hsu-Chieh Cheng holds a patent titled "FinFET Device with a Reduced Width." This innovative method involves the formation of a fin structure on a substrate, the establishment of a dummy gate structure wrapped around the fin, and the deposition of an interlayer dielectric (ILD) layer. The dummy gate structure is removed to expose a portion of the fin structure, followed by an etching process that reduces the width of that fin portion. This technique enhances the performance and efficiency of FinFET devices, marking a significant advancement in chip design.

Career Highlights: Hsu-Chieh Cheng has built a distinguished career at Taiwan Semiconductor Manufacturing Company, Ltd., where he focuses on cutting-edge semiconductor device research and development. His innovative approach and expertise contribute to the company’s reputation as a global leader in semiconductor manufacturing and technology, impacting various applications in consumer electronics.

Collaborations: Throughout his career, Hsu-Chieh has collaborated with prominent colleagues such as Ka-Hing Fung and Chen-Yu Hsieh. Their joint efforts further enrich the innovation landscape at Taiwan Semiconductor Manufacturing Company, Ltd., fostering advancements that benefit the wider technology sector.

Conclusion: Hsu-Chieh Cheng exemplifies the spirit of innovation within the semiconductor industry. With his patent on the FinFET device with reduced width, he illuminates the path toward more efficient electronic components, solidifying his role as a key inventor in the ever-evolving field of technology. His contributions, alongside his valued collaborations, underscore the importance of teamwork and creativity in driving future innovations.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…