Hsinchu, Taiwan

Hsiu Lan Pang

This inventor holds 1 USPTO granted patent. Top assignee: Nanometrics Inc.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hsiu Lan Pang. Retrieved from https://idiyas.com/inventor/hsiu-lan-pang-2ttkullq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Hsiu Lan Pang: Innovator in Semiconductor Metrology

Introduction

Hsiu Lan Pang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor device fabrication, particularly in overlay metrology methods. His innovative approach has led to advancements in measurement accuracy during the manufacturing process.

Latest Patents

Hsiu Lan Pang holds a patent for an "Overlay Measurement Target." This invention involves an overlay alignment mark that facilitates the alignment and measurement of alignment errors between two layers on a semiconductor wafer structure. The target is designed to be small enough to fit within the active area of a semiconductor device, combined with appropriate measurement methods to enhance measurement accuracy. He has 1 patent to his name.

Career Highlights

Pang is currently employed at Nanometrics Inc., a company known for its advanced metrology solutions. His work at Nanometrics has positioned him as a key player in the semiconductor industry, where precision and accuracy are paramount.

Collaborations

Hsiu Lan Pang collaborates with talented individuals such as Nigel Peter Smith and Yi-Sha Ku, who contribute to the innovative environment at Nanometrics Inc. Their combined expertise fosters a culture of creativity and advancement in semiconductor technologies.

Conclusion

Hsiu Lan Pang's contributions to semiconductor metrology exemplify the importance of innovation in technology. His work continues to influence the industry, paving the way for more accurate and efficient manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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