Nanometrics Inc.

Hsiu Lan Pang

Yi-Sha Ku

Nigel Peter Smith

In an overlay metrology method used during semiconductor device fabrication, an overlay alignment mark facilitates alignment and/or measurement of alignment error of two layers on a semiconductor wafer structure, or different exposures on the same layer. A target is small enough to be positioned within the active area of a semiconductor device combined with appropriate measurement methods, which result in improved measurement accuracy.

Growing community of inventors

Hsinchu, Taiwan

Hsiu Lan Pang