Hsiu-Chuan Chu

Title: Hsiu-Chuan Chu: Innovator in Semiconductor Technology

Introduction

Hsiu-Chuan Chu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to manufacturing processes.

Latest Patents

One of his latest patents is a silicon oxide gap-filling process. This process involves a chemical vapor deposition (CVD) technique that includes an etching effect to effectively fill trenches with silicon oxide. The reaction gases utilized in this CVD process consist of deposition gases and a He/H mixed gas, which serves as a sputtering-etching gas. Notably, the percentage of the He/H mixed gas increases with the aspect ratio of the trench.

Another significant patent is a method for forming a shallow trench isolation structure. This method entails the formation of a pad oxide layer and a mask layer on a substrate. The pad oxide layer, mask layer, and a portion of the substrate are patterned to create a trench. Following a rapid wet thermal process, a liner layer is deposited on the exposed surfaces, including the silicon surface within the trench. An oxide layer is then deposited to fill the trench, followed by a planarization process that exposes the mask layer. Finally, the mask layer and pad oxide layer are removed, completing the shallow trench isolation structure.

Career Highlights

Hsiu-Chuan Chu has worked with prominent companies in the semiconductor industry, including United Microelectronics Corporation and United Microelectronics Corp. His experience in these organizations has contributed to his expertise and innovative capabilities in semiconductor manufacturing.

Collaborations

Throughout his career, Hsiu-Chuan Chu has collaborated with talented individuals such as Chih-An Huang and Teng-Chun Tsai. These collaborations have likely fostered an environment of creativity and innovation, leading to advancements in their respective fields.

Conclusion

Hsiu-Chuan Chu's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods continue to impact the industry, showcasing the importance of creativity in technological advancements.