Hsin-Pai Chen

Title: Hsin-Pai Chen: Innovator in Semiconductor Technology

Introduction

Hsin-Pai Chen is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His innovative approaches have led to advancements in the manufacturing processes of semiconductor devices.

Latest Patents

One of Hsin-Pai Chen's latest patents is titled "Opposite focus control to avoid keyholes inside a passivation layer." This patent describes a method for forming closely spaced electrodes without the formation of restricted regions or keyholes. The technique involves using de-focussing to create the electrode mask pattern in a layer of photoresist, resulting in electrodes with a trapezoidal cross-section. This design helps to avoid issues when covering the electrodes with a conformal dielectric layer.

Another significant patent is the "Procedure for eliminating fluorine degradation of WSi.sub.x." This method enhances the dielectric stability and reliability of a polycide/oxide/polysilicon capacitor on a silicon wafer. By applying an in-situ high-temperature anneal within a CVD reactor, the process effectively prevents fluorine degradation of the oxide capacitor dielectric, leading to an increase in capacitance by as much as 10%.

Career Highlights

Hsin-Pai Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on improving manufacturing techniques and enhancing the performance of semiconductor devices.

Collaborations

Throughout his career, Hsin-Pai Chen has collaborated with several talented individuals, including Pei-Hung Chen and Dong-Shiuh Cheng. These collaborations have contributed to the successful development of innovative technologies in the semiconductor field.

Conclusion

Hsin-Pai Chen's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a key innovator in the industry. His work continues to influence advancements in manufacturing processes and device performance.