Hsin-Fu Tseng

Title: Hsin-Fu Tseng: Innovator in Photomask Inspection Technology

Introduction

Hsin-Fu Tseng is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of photomask inspection technology, holding a total of 7 patents. His work is crucial in advancing the semiconductor manufacturing process.

Latest Patents

Hsin-Fu Tseng's latest patents include innovative methods and apparatuses for photomask inspection. One of his notable inventions is an inspection apparatus that features a stage designed to receive a photomask, a radiation source that emits a first radiation beam for inspecting the photomask, and an aperture stop that receives a second radiation beam reflected from the photomask. The aperture is tangent at the center of the aperture stop, enhancing the precision of the inspection process. Another patent describes a similar inspection apparatus, which includes a mirror that directs a first radiation beam from the radiation source to the photomask at a first tilt angle, along with a detector that generates an image of the photomask based on the second radiation beam.

Career Highlights

Hsin-Fu Tseng is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to apply his innovative ideas in a practical setting, contributing to the advancement of technology in the field.

Collaborations

Throughout his career, Hsin-Fu Tseng has collaborated with notable colleagues, including Chih-Wei Wen and Chien-Lin Chen. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Hsin-Fu Tseng is a key figure in the realm of photomask inspection technology, with a proven track record of innovation and collaboration. His contributions continue to impact the semiconductor industry significantly.