Hsinchu, Taiwan

Hsin-Fang Su

This inventor holds 2 USPTO granted patents. Top assignee: Macronix International Co., Ltd.. Active years: 2013-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hsin-Fang Su. Retrieved from https://idiyas.com/inventor/hsin-fang-su

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2013-2017

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2 patents (USPTO):Explore Patents

Title: Hsin-Fang Su: Innovator in Semiconductor Technology

Introduction

Hsin-Fang Su is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His innovative work focuses on methods and structures that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

Hsin-Fang Su's latest patents include an etching method and a structure of a semiconductor device. The etching method is directed to a process for patterning a material layer. This method involves providing a material layer with a first hard mask layer and a second hard mask layer formed successively. The second hard mask layer is patterned, followed by an etching process that patterns the first hard mask layer using the patterned second hard mask layer as a mask. This etching process is performed with a power of about 1000 W. Subsequently, the material layer is patterned using the patterned first hard mask layer as a mask.

The second patent pertains to a structure of a semiconductor device that includes a substrate and a patterned layer. This patterned layer is designed to have both an open area and a dense area. Within the dense area, there is a first pattern adjacent to the open area and a second pattern. The first pattern features a first bottom, while the second pattern has a second bottom width. Notably, the bottom of the first pattern includes a recess facing the open area, ensuring that the first bottom width is close to the second bottom width.

Career Highlights

Hsin-Fang Su is currently employed at Macronix International Co., Ltd., where he continues to innovate and contribute to advancements in semiconductor technology. His work has been instrumental in developing methods that improve the manufacturing processes of semiconductor devices.

Collaborations

Hsin-Fang Su collaborates with notable colleagues, including Yu-Chung Chen and Shin-Chang Tsai. Their combined expertise fosters an environment of innovation and creativity within the field.

Conclusion

Hsin-Fang Su is a distinguished inventor whose contributions to semiconductor technology are noteworthy. His patents reflect a commitment to advancing the industry and improving manufacturing processes. His work continues to influence the future of semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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