This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023
Title: Hsiao-Wei Chen: Innovator in Semiconductor Technology
Introduction
Hsiao-Wei Chen is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique patent that enhances the manufacturing process of semiconductor devices.
Latest Patents
Hsiao-Wei Chen holds a patent for a semiconductor structure and a planarization method thereof. This method involves forming a dielectric layer over a polish stop layer. The dielectric layer is polished until it reaches the polish stop layer, resulting in a polished dielectric layer with a concave top surface. A compensation layer is then formed over this concave top surface and subsequently polished. This innovative approach improves the efficiency and effectiveness of semiconductor manufacturing.
Career Highlights
Hsiao-Wei Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to collaborate with other talented professionals in the field.
Collaborations
Some of his notable coworkers include Han-Wen Liao and Chun-Jung Huang. Their collective expertise contributes to the advancement of semiconductor technologies.
Conclusion
Hsiao-Wei Chen's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile