Company Filing History:
Years Active: 2019
Title: Hsiao-Lin Yang: Innovator in Capacitor Technology
Introduction
Hsiao-Lin Yang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of capacitor technology, particularly in applications related to liquid crystal displays. His innovative work focuses on enhancing the performance and efficiency of capacitors used in thin film transistor devices.
Latest Patents
Hsiao-Lin Yang holds a patent for "Interface engineering for high capacitance capacitor for liquid crystal display." This patent outlines methods for forming capacitors that exhibit high capacitance and low leakage, while also ensuring effective interface control for thin film transistor applications. The invention includes a thin film transistor structure that features a capacitor with a common electrode on a substrate, a dielectric layer, and a pixel electrode. Additionally, an interface protection layer is incorporated to enhance the performance of the capacitor.
Career Highlights
Hsiao-Lin Yang is associated with Patterson + Sheridan LLP, where he continues to develop and refine his innovative ideas. His work has been instrumental in advancing capacitor technology, making significant strides in the efficiency and reliability of electronic devices.
Collaborations
Hsiao-Lin Yang has collaborated with notable colleagues, including Xuena Zhang and Dong-Kil Yim. These partnerships have contributed to the successful development of his patented technologies.
Conclusion
Hsiao-Lin Yang is a key figure in the field of capacitor technology, with a focus on improving the performance of liquid crystal displays. His innovative patent and collaborations highlight his commitment to advancing technology in this area.