This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Kinik Company. Active years: 2008-2009.
Company Filing History:
Years Active: 2008-2009
Title: Hsiao-Kuo Chang: Innovator in Diamond Technology
Introduction
Hsiao-Kuo Chang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of diamond technology, holding 2 patents that showcase his innovative approaches to fabricating diamond substrates and films. His work has implications for various applications, particularly in the semiconductor industry.
Latest Patents
One of Hsiao-Kuo Chang's latest patents is titled "Diamond substrate and method for fabricating the same." This invention involves a diamond substrate where a SiC layer is formed on the lower surface of a diamond layer. This design prevents deformation of the diamond layer during the fabrication process. The SiC layer mitigates the lattice mismatch between the diamond film layer and the semiconductor layer, improving the crystalline quality of the semiconductor layer while simplifying the fabrication process and enhancing performance and stability.
Another notable patent is the "Method for manufacturing diamond film." This method utilizes a substrate made from a material with a low thermal decomposition point. A buffer layer is formed on this substrate through coating or deposition, followed by the application of a diamond film. The buffer layer improves the uniformity of the diamond film coating, addressing issues such as thermal stress cracking and assembly damage. This innovative approach overcomes challenges related to high temperatures during the diamond film formation process.
Career Highlights
Hsiao-Kuo Chang is associated with Kinik Company, where he continues to develop and refine his inventions. His work has positioned him as a key figure in the advancement of diamond technology, particularly in applications that require high-performance materials.
Collaborations
Hsiao-Kuo Chang has collaborated with notable colleagues, including Jen-Sheuan Huang and Chih-Peng Chen. These partnerships have contributed to the successful development of his innovative technologies.
Conclusion
Hsiao-Kuo Chang's contributions to diamond technology through his patents reflect his commitment to innovation and excellence. His work not only enhances the performance of semiconductor materials but also paves the way for future advancements in the field.