Hsiao-Chiang Lin

Title: Innovations and Patents of Hsiao-Chiang Lin

Introduction

Hsiao-Chiang Lin is a notable inventor based in New Taipei, Taiwan. With a total of four patents to his name, he has made significant contributions to the field of semiconductor technology.

Latest Patents

Among his most recent inventions, Lin has developed a method of patterning an underlying structure. This method involves a first patterning process that creates a structured layer with specific openings, followed by the formation of a patterned photoresist layer designed to fill those openings. A subsequent patterning process further refines the structure by creating additional openings.

Another key patent is for a method of designing a photomask. This innovative approach includes calculating the open ratio of an initial photomask. If this ratio is found to be below 25%, Lin suggests altering the design to reverse the tone, ensuring that the modified photomask achieves an open ratio of 75% or more, which effectively addresses issues arising from the thermal expansion of photomasks.

Career Highlights

Lin has worked at prominent companies in the semiconductor sector, including Powerchip Semiconductor Manufacturing Corporation and Powerchip Technology Corporation. His expertise and inventions have significantly impacted the industry, showcasing his ability to innovate and adapt.

Collaborations

Throughout his career, Hsiao-Chiang Lin has collaborated with talented individuals such as Yu-Hsuan Chang and Li-Chun Tseng. These partnerships have enriched his work and contributed to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Hsiao-Chiang Lin exemplifies the spirit of innovation in the technology sector. His patents not only reflect his inventive capabilities but also contribute to advancements in the semiconductor industry. As he continues to push the boundaries of what is possible, Lin remains a key figure in the world of innovations and patents.